|
ASTM
D 1418 Designation: FFKM
ASTM
D 2000, SAE J200 Type / Class: JK, HK
STANDARD
COLOR: Black
TRADE
NAMES:
• Aegis® (International Seal - FNGP)
• Chemraz® (Greene, Tweed & Company)
• Kalrez® (DuPont Dow Elastomers)
RELATIVE
COST: Very High
GENERAL
TEMPERATURE RANGE: -25° to +575° F
Most
commercial perfluoroelastomers are terpolymers of
tetrafluoroethylene (TFE), perfluoromethylvinyl ether
(PMVE), and a cure site monomer (CSM).
The fully-fluorinated monomers contained in perfluoroelastomers
are the reason they exhibit superior chemical resistance
(see Figure 43). As with fluorocarbon elastomers,
the bonds between
carbon and fluorine atoms are
extremely strong, making the chemical structure virtually
unbreakable. Also, polymers with
high levels of fluorine (as opposed to hydrogen)
have proven to be more stable and less chemically
reactive. Perfluoroelastomers also enjoy immunity
from chemical attack due to saturation along
the polymer’s backbone. There are no double
bonds to be attacked by degradants such
as oxygen, ozone, UV light,
or harsh chemicals.
Perfluoroelastomers
can trace their lineage back to the late 1960s,
when chemists at DuPont pioneered what came to
be known as Kalrez®. In so
doing, they combined the chemical resistance of Teflon® and
the elasticity of Viton® into
a fully-fluorinated polymer that could be cross-linked.
Differences in perfluoroelastomer performance are
often due to the manner in which the material is
cross-linked. In the early days, perfluoroelastomer compounds made
use of bisphenol cross-links (like those still
seen in current copolymer fluoroelastomers).
Bisphenol curing works
fine for fluoroelastomers, but it became clear
that these bisphenol cross-links were causing perfluoroelastomers
to undergo a high degree of compression
set. As a result, in the mid-80s DuPont developed
compound 4079. This new perfluoroelastomer formulation
utilized high temperature triazine cross-links.
Compression set was reduced, and, as an added bonus,
thermal properties were enhanced, allowing the
material to stay resilient even
in temperatures approaching 600° F, 316° C
(see Table 11).
Because
of the presence of aggressive chemicals and the
need to exclude microcontaminants, seals used in
the manufacturing of integrated circuits (ICs)
must withstand harsh fluids while
resisting extraction.
Perfluoroelastomers like Kalrez (which is resistant
to over 1,600 solvents,
chemicals, and plasmas) have found wide use within
the semiconductor
industry. Kalrez seals are also common
in the oil exploration and refining industries,
as well as in chemical processing and transportation
seals. Be aware that Kalrez’s vulnerability
to compression set generally increases as temperatures
go up. Despite its overall chemical resistance,
Kalrez can swell when
in contact with uranium hexafluoride, fully halogenated
Freon®, and some fluorinated solvents. Kalrez
should not be exposed to molten or gaseous alkali
metals.
As
instrumental as they were to the development and
acceptance of perfluoroelastomer compounds, the
DuPont personnel were not the only ones on the
case. At about the same time that DuPont was finding
new success with triazine cross-links, another
company was experimenting with peroxide cure systems.
Greene, Tweed & Company started producing Chemraz® parts
based on an imported peroxide cross-linked perfluoroelastomer.
Chief
among Chemraz’s virtues is its outstanding
overall chemical compatibility.
Chemraz compounds are resistant to almost every
chemical compound, including fuels, ketones, esters,
alkalines, alcohols,
aldehydes, and both organic and inorganic acids.
Chemraz also has very good resistance to compression
set, and it offers outstanding steam resistance.
Chemraz has an upper temperature limit of about
450° F (232° C). As with Kalrez, Chemraz
has found a place in the demanding semiconductor
industry. Greene, Tweed prepares Chemraz compounds
in a state-of-the-art clean room to ensure purity
from the very beginning.
Not
to be outdone, International Seal Company (now
known as International Seal - FNGP) launched a
perfluoroelastomer program in 1996. They developed
their compound – known as Aegis® – with
an eye toward providing a cost-competitive (yet
still high performance) alternative to Kalrez and
Chemraz. The 1998 merger of International Seal
with Freudenberg-NOK provided significant improvements
in both the technology and the processing of perfluoroelastomers.
Some of IS-FNGP’s perfluoroelastomer compounds
are cross-linked using peroxide; some are not.
In
1999, IS-FNGP (International Seal - FNGP) introduced
five new Aegis compounds specifically tailored
to the semiconductor industry, and each of these “SC” perfluoroelastomers
is environment-specific. For example, SC1001 is
a low compression set compound intended primarily
for wet chemical applications. SC1011 is used mainly
in dry process, vacuum,
and plasma environments. SC1090 is the cleanest
grade and is useful for both wet chemical and plasma
projects. SC1070 is a high temperature formulation
(viable up to 572° F, 300° C) intended
for low-pressure chemical vapor deposition
and furnace applications. With high
temperature resistance comparable to SC1070,
SC1071 is suited for aggressive plasma environments.
New Aegis compounds are also being developed in
response to industry needs. As a matter of fact,
IS-FNGP offers a wide range of seal materials (produced
in a class 100/1000 clean room) specifically designed
to provide both the high purity and the extraordinary
chemical resistance demanded by the semiconductor
industry.
Aegis
seals are also commonly used in chemical and petroleum
processing, analytical instruments, automotive
systems (fuel and oil), and spray painting systems.
The main advantages of Aegis compounds over Kalrez
and Chemraz: less compression set and higher strength
at a lower cost.
FFKM
PERFORMS WELL IN:
• Most chemical & petrochemical
situations
FFKM
DOES NOT PERFORM WELL IN:
• Uranium hexafluoride
• Fully halogenated
Freon®
• Some fluorinated
solvents
MATERIAL
PROFILES MAIN PAGE
|
“The
fully-fluorinated monomers contained in FFKM
are the reason it exhibits superior chemical
resistance.”

Figure 43

Table 11
|